Photoresist,Anti-Reflective Coating Strippers & Post-Etch Residue Removers
Solve demanding yield and fabrication challenges with advanced J.T.Baker® photoresist, anti-reflective coating (ARC) strippers and post-etch ash residue removal products engineered to keep your fab lines operating with peak productivity.
Whether you face limits using traditional solvent-based chemistries to effectively process ever-smaller device geometries, more complex integration issues that arise with new materials, such as copper interconnects and low-k dielectrics, or need to migrate to aqueous based chemistries our J.T.Baker® microelectronics performance chemistries are specifically formulated to solve cleaning and surface preparation issues on both aluminum-based and copper-based integration schemes.
Products Available
Bulk Photoresist Stripper
Photoresist Stripper
Anti-reflective Coating Removal
Aluminum/Silicon Oxide Compatible Residue Remover
Low-k Dielectric Compatible Residue Remover
Copper Compatible Residue Remover
Hard Mask Removal or Modification